1200°C High-Performance CVD System
High-performance 1200°C Chemical Vapor Deposition (CVD) System – Complete, turn-key solution for advanced thin-film deposition and nanotech research.
The CVD-1200C is a premium, CE-certified chemical vapor deposition system engineered to deliver atomic-level control over thin-film growth up to 1200°C with ±1°C accuracy. This complete turn-key package combines a split-body tube furnace, a high-purity quartz reaction tube, a multi-channel gas mixing station (available with float flowmeters or digital Mass Flow Controllers), and a heavy-duty TRP-12 dual-stage vacuum pump system.
Featuring customizable sliding configurations for rapid heating and cooling steps, pre-installed quick-release KF25 vacuum flanges, and independent multi-zone temperature controls, this dynamic setup represents the premier choice for nanomaterial synthesis and graphene growth in UK materials research laboratories.
Exclusive UK Distributor: Benli Lab – Direct from Hefei Weiyuansu with full local technical support.
1200°C High-Performance Chemical Vapor Deposition System – CVD-1200C Series
Benli Lab is the Exclusive UK Distributor of Hefei Weiyuansu Laboratory Equipment. The CVD-1200C series turn-key Chemical Vapor Deposition (CVD) system is engineered to provide an integrated, high-reliability platform for synthesizing advanced nanomaterials, 2D crystals (like graphene and MoS₂), and protective coatings. By seamlessly consolidating high-purity atmosphere tube furnaces, automated gas-mixing manifolds, and industrial-grade vacuum pumping stations into a mobile workspace cabinet, this system delivers exceptionally uniform and reproducible film deposition for elite research laboratories across the United Kingdom.
Key Features & Benefits
- Integrated Turn-Key Design – Consolidates the high-temperature tube furnace, the multi-channel gas mixing system, and the vacuum pumps into a clean, mobile laboratory cart with locking casters.
- Precise Multi-Channel Gas Control – Outfitted with a professional gas delivery cabinet. Supports multiple gas inlet channels (such as N₂, Ar, O₂, and H₂) with an integrated stainless steel mixing tank. Available with high-precision Mass Flow Controllers (MFC) or budget-conscious float flowmeters.
- Dual-Stage Vacuum Station – Ships with a heavy-duty TRP-12 dual-stage rotary vane vacuum pump capable of drawing vacuum levels down to 10⁻² Torr quickly and cleanly via high-purity stainless steel KF25 connections.
- Outstanding Thermal Uniformity – Crafted using high-purity polycrystalline alumina fibre chamber panels lined with US-imported high-temperature alumina coatings to maximize heat reflection, decrease power consumption, and maintain exceptionally flat temperature zones.
- Dynamic Thermal Step Transitioning – Compatible with manual or motorized sliding rail configurations to slide the furnace chamber over or away from the sample zone for ultra-fast heating and cooling rates.
- Industrial-Grade Safety – Built with integrated safety interlocks including active door-open power cutoffs, earth leakage isolation, thermocouple-break fail-safes, and over-temperature safety loops.
Technical Specifications
CVD-1200C – Complete System Component Specifications
• Max Temperature: 1200°C (<0.5 h)
• Continuous Working Temperature: ≤ 1100°C
• Recommended Heating Rate: ≤ 10°C/min
• Heating Zone Length: 440 mm (Single or customizable Multi-Zone options)
• Reaction Tube Size: Φ60 × 1200 mm High-Purity Quartz (Other sizes up to Φ100 mm available)
• Rated Power: 3.1 kW | Voltage: 220V 50/60Hz Standard Power Interface
• Temperature Controller: YD858 digital PID with 50 programmable segments and auto-tuning
• Thermocouple: K-Type Sensor
2. Gas Delivery & Mixing Module (MFC / Float Cabinet):
• Multi-Channel Support: Optional 2-channel, 3-channel, or 4-channel configurations
• Control Hardware: High-precision Mass Flow Controllers (MFC with ±1.5% accuracy) or Float Flowmeters (4% accuracy)
• Standard MFC Range Options: 1-100 SCCM, 1-200 SCCM, 1-500 SCCM (Other ranges customizable)
• Mixed Gas Mechanics: Internal stainless steel mixing vessel with non-return check valves
• Plumbing Line: 6.35 mm PTFE and high-purity stainless steel tubing networks
3. Pumping & Vacuum Module (TRP-12 Dual-Stage Pump):
• Ultimate Vacuum Pressure: 4 × 10⁻² Pa (Partial Pressure) / 4 × 10⁻¹ Pa (Total Pressure)
• Volumetric Pumping Rate: 3 L/S (50Hz) / 7.2 L/S (60Hz)
• Pumping Interface: High-purity stainless steel KF25 flange, clamps, and 1.2 m flexible metal bellows
• Vacuum Monitoring: Optional digital LCD vacuum gauge and manual vacuum isolation valves
• Motor Power: 0.55 kW | Voltage: 220V 50/60Hz
* Customisation available. Specifications subject to final confirmation. Note: Standard system is not recommended for toxic, explosive, or aggressively corrosive gases without specialized, custom-engineered safety upgrade packages.
Applications
Perfect for synthesis of graphene, carbon nanotubes (CNTs), and transitioning metal dichalcogenides (TMDs like MoS₂), chemical vapor infiltration (CVI), ceramic matrix composites processing, specialized semiconductor thin-film coatings, and advanced gas-solid reactive research.
Why Choose Benli Lab? Direct factory access ensures genuine equipment, best pricing, customisation options, and dedicated UK-based technical support, installation guidance, and after-sales service.
Benli Lab – Empowering UK Research with Innovative High-Temperature Laboratory Solutions
| Model | CDV |
|---|---|
| Furnace Type | Muffle Furance |
| Maximum Temperature | 1200°C (short-term < 0.5 h) |
| Customisation Available | No |
| Voltage | 220V - 230V |
| Power (kW) | 3.1 |