1200°C High-Performance CVD System
High-performance 1200°C Dual-Zone Plasma Enhanced Chemical Vapor Deposition (PECVD) System – Double-zone precision and low-temperature deposition for advanced 2D materials and semiconductor research.
The OYS-1200C-II-PECVD is a premium, CE-certified dual-zone plasma-enhanced CVD system designed to synthesize high-purity thin films at reduced substrate temperatures up to 1200°C with ±1°C accuracy. Combining a dual-temperature-zone split-body sliding muffle furnace with a 300W RF plasma generator (13.56 MHz) and a high-precision 3-channel Mass Flow Controller (MFC) gas mixing station, this system allows independent control over source vaporization and substrate deposition temperatures.
Featuring a dynamic sliding rail base for rapid thermal quenching, an automatic impedance matching network, and a heavy-duty TRP-12 dual-stage vacuum pumping station, this turn-key platform delivers unparalleled control over film thickness, stress, and stoichiometry for elite UK nanotechnology laboratories.
Exclusive UK Distributor: Benli Lab – Direct from Hefei Weiyuansu with full local technical support.
1200°C Dual-Zone Plasma Enhanced Chemical Vapor Deposition System – OYS-1200C-II-PECVD Series
Benli Lab is the Exclusive UK Distributor of Hefei Weiyuansu Laboratory Equipment. The OYS-1200C-II-PECVD turn-key Plasma Enhanced Chemical Vapor Deposition system provides material scientists with dual-zone temperature control and low-temperature plasma-activated reaction mechanics. By utilizing radio frequency (RF) energy to generate a low-temperature, high-density plasma inside a quartz process tube, the system allows chemical vapor reactions to proceed at a fraction of the thermal energy required by standard CVD. Combined with two independently controlled heating zones, this turn-key platform enables researchers across the United Kingdom to isolate precursor sublimation from localized thin-film deposition with maximum precision.
Key Features & Benefits
- Independent Dual-Zone Heating – Two separate temperature zones are controlled by individual PID microprocessors, allowing users to establish precise thermal gradients or uniform co-evaporation profiles along the process tube.
- Low-Substrate Temperature Firing – Active 13.56 MHz radio frequency (RF) plasma excitation dissociates gas precursors at low ambient temperatures, making it possible to deposit uniform SiNx, SiOx, and carbon thin films on thermally sensitive substrates.
- 300W Adjustable RF Plasma Generator – Outfitted with a premium 0–300W adjustable RF power supply featuring an automated impedance matching network and air-cooled housing to keep reflected power close to zero.
- Dynamic Sliding Rail Architecture – The entire split-body muffle furnace and RF electrode assembly are integrated onto horizontal sliding guide rails. Slide the hot zone onto the sample for rapid heat-up, or slide it away for immediate quenching to protect the structural integrity of thin films.
- High-Precision 3-Channel MFC Mixing – Outfitted with the GYS-3Z gas mixing station utilizing digital Mass Flow Controllers (±1.5% accuracy) and a pre-installed stainless steel mixing tank to ensure highly repeatable gas stoichiometry.
- Complete Vacuum Flange Sealing – Includes quick-release KF25 vacuum flanges, dual mechanical pressure gauges, and flexible metal bellows connected to a heavy-duty TRP-12 dual-stage mechanical pump.
- Certifications & Quality – Assembled in full compliance with international CE, UL, and MET standards using globally recognized sub-components (ABB switches, Omega sensors, and Yudian/Eurotherm instruments).
Technical Specifications
OYS-1200C-II-60-PECVD – Dual-Zone PECVD System Specifications
• Max Temperature: 1200°C (<0.5 h)
• Continuous Working Temperature: ≤ 1100°C
• Recommended Heating Rate: ≤ 10°C/min
• Heating Zone Configuration: Dual Zone (200 mm + 200 mm) independently controlled
• Reaction Tube Size: Φ60 × 1400 mm High-Purity Quartz (Other sizes up to Φ100 mm available)
• Rated Power: 3.1 kW | Voltage: 220V 50/60Hz Standard Power Interface
• Temperature Controllers: 2 × YD858 digital PID with 50 programmable segments and auto-tuning
• Thermocouple: Dual K-Type Sensors
2. Plasma Module (RF Power Generator):
• Output Power: 0 to 300 W (Continuous, adjustable)
• RF Frequency: 13.56 MHz (±0.005% frequency stability)
• Impedance Matching: Fully automatic matching network
• Reflected Power Protection: Built-in safety cutoff loops with air-cooled housing
• Voltage: 180 - 250V AC input
3. Gas Delivery Module (GYS-3Z MFC Console):
• Active Gas Channels: 3 Channels with independent MFC flow controls
• Control Hardware: High-precision Mass Flow Controllers (MFC with ±1.5% accuracy)
• MFC Range Options: 1-100 SCCM, 1-200 SCCM, 1-500 SCCM (Other ranges customizable)
• Pressure Gauge Range: -0.1 to 0.15 MPa with mechanical needle control valves
• Mixing Tank: Built-in high-purity stainless steel mixing vessel (Φ80 × 120 mm)
4. Vacuum Module (TRP-12 Dual-Stage Pump):
• Ultimate Vacuum Pressure: 4 × 10⁻² Pa (Partial Pressure) / 4 × 10⁻¹ Pa (Total Pressure)
• Volumetric Pumping Rate: 3 L/S (50Hz) / 7.2 L/S (60Hz)
• Pumping Interface: Stainless steel KF25 flange, clamps, and 1.2 m flexible metal bellows
• Vacuum Monitoring: Optional digital LCD vacuum gauge and manual vacuum isolation valves
* Customisation available. Specifications subject to final confirmation. Note: Toxic, flammable, or aggressively corrosive precursor gases are strictly prohibited from being introduced without custom-engineered gas scrubbing and specialized safety packages.
Applications
Perfect for low-temperature deposition of silicon dioxide (SiO₂), silicon nitrides (Si₃N₄), silicon oxynitride films (SiOxNy), amorphous hydrogenated silicon (a-Si:H), carbon nanostructures, graphene growth, 2D transition metal dichalcogenides (TMDs), and anti-reflective optical coatings on thermally sensitive polymers and microelectronic substrates.
Why Choose Benli Lab? Direct factory access ensures genuine equipment, best pricing, customisation options, and dedicated UK-based technical support, installation guidance, and after-sales service.
Benli Lab – Empowering UK Research with Innovative High-Temperature Laboratory Solutions
| Model | OYS-1200C-I-60I-PECVD |
|---|---|
| Furnace Type | Tube Furance |
| Maximum Temperature | 1200°C (short-term < 0.5 h) |
| Customisation Available | No |